Mini Review
Published: 29 January, 2025 | Volume 8 - Issue 1 | Pages: 013-016
The results of the study of the texture of thin films of aluminum nitride obtained by magnetron sputtering are presented. The dependence of the sizes and degree of preferential orientation of crystallites on the conditions of formation of thin films (pressure, discharge power, composition of the plasma-forming gas) is investigated.
Read Full Article HTML DOI: 10.29328/journal.ijpra.1001106 Cite this Article Read Full Article PDF
Aluminum nitride films; Magnetron sputtering; Texture; Coherent scattering region size
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